Ion implantation is one of the key technologies and is used multiple times along the semiconductor manufacturing chain. During the ion implantation process silicon wafers are bombarded by a beam of electrically charged ions, called dopants. Most of todays tools are multi purpose tools to handle more than one process.

Implant energies reach up to 5 MeV to suit the todays 300 mm production requirements. Various implanter positions like source, beamline, analyzer magnet and load/lock require high vacuum in the range of 10^-4 - 10^-7 mbar, which his generated by turbo pumps. For load/lock applications the revolutionary OnTool Booster^TM can be the pump of choice.

 

Main fields of application for our products are:
 

Our products are used for: