Lithography
Vacuum Solutions for Lithography
One of the first steps in the semiconductor manufacturing chain is the Lithography, which transfers the pattern from the mask/reticle to the layer of photoresist.
The kind of lithography method depends on the wavelength of radiation used to expose the photoresist. The reduction in feature size allows to produce higher performance, lower energy consuming IC devices for the next generation.
The vacuum process is run in a high to ultra high vacuum environment in the range of 10-9 mbar. Major system requirements are lowest vibration and contamination free vacuum.
The products from Pfeiffer Vacuum are offering ideal performances to comply with the requirements.
The products from Pfeiffer Vacuum are offering ideal performances to comply with the requirements.
Main fields of application for our products are:
- Photolithography
- X-ray Lithography
- E-beam Lithography
- EUV Lithography
- Load/Lock
Our products are used for:
Vacuum generation
Vacuum measurement
Quantitative analysis
Leak detection
